Reference – STAR Sputtering (SpuTtering for Advanced Research)¶
This page documents all ELN entry types in the STAR category, which covers magnetron sputtering experiments performed on the STAR deposition system at INL.
SputteringTarget¶
Category: STAR
Base class: CompositeSystem, EntryData
A persistent record of a physical sputtering target. Each SputteringTarget
entry acts as a logbook: it accumulates usage time and energy across all
experiments that reference it, and can alert when recalibration is needed.
Quantities¶
| Quantity | Type | Unit | Description |
|---|---|---|---|
name |
str |
– | Human-readable target name (inherited) |
lab_id |
str |
– | Unique lab identifier (inherited) |
supplier |
str |
– | Manufacturer or supplier of the target |
delivery_date |
Datetime |
– | Date the target was received |
installation_date |
Datetime |
– | Date the target was installed in the chamber |
last_calibration_date |
Datetime |
– | Date of the most recent calibration |
calibration_interval_time |
float |
hours | Usage time threshold that triggers recalibration |
calibration_interval_energy |
float |
kWh | Energy threshold that triggers recalibration |
total_deposition_time |
float |
hours | Accumulated time across all deposition records (auto) |
total_deposition_energy |
float |
kWh | Accumulated energy across all deposition records (auto) |
time_since_last_calibration |
float |
hours | Time accumulated since last_calibration_date (auto) |
energy_since_last_calibration |
float |
kWh | Energy accumulated since last_calibration_date (auto) |
needs_calibration |
bool |
– | True if any threshold is exceeded (auto) |
Sub-sections¶
| Sub-section | Type | Description |
|---|---|---|
target_id |
ReadableIdentifiers |
Structured INL/LaNaSC identifier |
geometry |
Geometry |
Physical dimensions of the target |
components |
PureSubstanceComponent (repeats) |
Chemical composition |
calibration_data |
StarCalibrationDataReference |
Current calibration entry |
old_calibration_data |
StarCalibrationDataReference (repeats) |
Historical calibrations |
deposition_records |
TargetDepositionRecord (repeats) |
Usage log (auto-appended) |
Normalization behavior¶
- Sets
target_raw_pathto the upload file path (used for cross-entry record writing) - Recomputes
total_deposition_time,total_deposition_energy,time_since_last_calibration,energy_since_last_calibration - Sets
needs_calibration = Trueif either threshold is exceeded
TargetDepositionRecord¶
Base class: ArchiveSection
A single entry in a target's usage log. Records are written automatically by
StarSputtering.normalize().
| Quantity | Type | Unit | Description |
|---|---|---|---|
experiment |
SputterDeposition |
– | Reference to the sputtering experiment |
source_index |
int |
– | Index of the source slot used |
deposition_time |
float |
hours | Total powered time in this experiment |
deposition_energy |
float |
kWh | Total energy delivered in this experiment |
StarCalibrationData¶
Category: STAR
Base class: EntryData
Stores the measured deposition rate from a calibration run.
| Quantity | Type | Unit | Description |
|---|---|---|---|
calibration_date |
Datetime |
– | Date of the calibration |
deposition_rate |
float |
nm/min | Measured rate |
calibration_experiment |
SputterDeposition |
– | Reference to the calibration run |
StarSputteringRecipe¶
Category: STAR
Base class: EntryData
A reusable template of StarStep objects. Apply by setting the Recipe
reference on a sputtering experiment and ticking Apply recipe.
| Quantity | Type | Description |
|---|---|---|
name |
str |
Recipe name |
description |
str |
Rich-text description |
Sub-sections:
| Sub-section | Type | Description |
|---|---|---|
steps |
StarStep (repeats) |
Ordered sequence of deposition steps |
StarRFSputtering / StarDCSputtering¶
Category: STAR
Base class: SputterDeposition, EntryData
These are the two concrete entry types for sputtering experiments. They
inherit all fields from StarSputtering and differ only in the step types
they use.
| Method | Step types available |
|---|---|
StarRFSputtering |
PresputteringRFStep, StabilizationRFStep, SputteringRFStep |
StarDCSputtering |
PresputteringDCStep, StabilizationDCStep, SputteringDCStep, PostSputteringDCStep |
Quantities (from StarSputtering)¶
| Quantity | Type | Unit | Description |
|---|---|---|---|
name |
str |
– | Experiment name |
operator |
str |
– | Person who ran the experiment |
base_pressure |
float |
mbar | Chamber base pressure before deposition |
is_a_calibration_experiment |
bool |
– | Mark as calibration run |
apply_recipe |
bool |
– | Trigger recipe application on normalize |
Sub-sections (from StarSputtering)¶
| Sub-section | Type | Description |
|---|---|---|
sources |
SputteringSource (repeats) |
Magnetron guns; each references a SputteringTarget |
steps |
StarStep (repeats) |
Deposition step sequence |
samples |
StarStackReference (repeats) |
Thin-film stacks produced |
recipe |
StarSputteringRecipeReference |
Recipe to apply |
Normalization behavior¶
For each SputteringSource that references a SputteringTarget:
- Computes the total powered time and energy for the source across all steps
- Writes a
TargetDepositionRecordto the target entry - Triggers re-normalization of the target so its totals are updated
Step types¶
All step types inherit from StarStep which in turn extends VaporDepositionStep.
| Class | RF/DC | Description |
|---|---|---|
PresputteringRFStep |
RF | Pre-sputtering cleaning step with shutter closed |
StabilizationRFStep |
RF | Plasma stabilization before opening shutter |
SputteringRFStep |
RF | Main deposition step |
PresputteringDCStep |
DC | Pre-sputtering cleaning |
StabilizationDCStep |
DC | Plasma stabilization |
SputteringDCStep |
DC | Main deposition step |
PostSputteringDCStep |
DC | Post-sputtering cool-down |
Common step quantities:
| Quantity | Unit | Description |
|---|---|---|
duration |
s | Step duration |
creates_new_thin_film |
– | Toggle to auto-create film/stack entries |
set_power / power |
W | Set-point and measured power |
set_voltage / voltage |
V | DC voltage (DC steps only) |
set_current / current |
A | DC current (DC steps only) |
Ct_value / Cl_value |
– | RF tuning capacitor values (RF steps only) |
chamber_pressure |
mbar | Measured chamber pressure during step |
substrate_temperature |
°C | Substrate heater set-point for this step |
substrate_rotation_enabled |
bool | Whether substrate rotation is active |
substrate_rotation_speed |
rpm | Target rotation speed |
substrate_rotation_direction |
enum | Clockwise or Counter-clockwise |
SeleniumCell¶
Category: STAR
Base class: EntryData
Persistent entity that tracks a physical selenium effusion cell: weight over time and refill history.
| Quantity | Type | Unit | Description |
|---|---|---|---|
refill_date |
Datetime |
– | Date of the last selenium refill |
Sub-sections:
| Sub-section | Type | Description |
|---|---|---|
weight_records |
SeleniumCellWeightRecord (repeats) |
Timestamped weight measurements |
SeleniumCellWeightRecord¶
| Quantity | Type | Unit | Description |
|---|---|---|---|
weight |
float |
g | Measured weight of the cell |
measurement_date |
Datetime |
– | Date of the measurement |
INLSeleniumPulseParameters¶
Base class: ArchiveSection
Label: Selenium Pulse Parameters
Describes the pulsed selenium environment used in reactive DC sputtering steps and selenization annealing steps.
| Quantity | Type | Unit | Description |
|---|---|---|---|
valve_opening |
float |
mm | Valve aperture controlling Se flux |
time_on |
float |
s | Se pulse duration (valve open) |
time_off |
float |
s | Interval between pulses (valve closed) |
cell_temperature |
float |
°C | Effusion cell temperature |
cracker_current |
float |
A | Cracker supply current |
cracker_voltage |
float |
V | Cracker supply voltage |
cracker_power |
float |
W | Cracker power – auto-computed: current × voltage (auto) |
cracker_power_percentage |
float |
% | Cracker power as % of maximum |
process_time |
float |
min | Total duration of Se pulsing |
total_se_on_time |
float |
s | Total selenium exposure – auto-computed (auto) |
Sub-sections:
| Sub-section | Type | Description |
|---|---|---|
selenium_cell |
SeleniumCellReference |
Reference to the SeleniumCell entity |
Normalization:
cracker_power = cracker_current × cracker_voltagetotal_se_on_time = round(process_time / (time_on + time_off)) × time_on
STARDCReactiveSputtering¶
Category: STAR
Base class: StarDCSputtering, EntryData
Label: STAR DC Reactive Sputtering
DC sputtering with simultaneous pulsed selenium. Inherits all StarDCSputtering
behavior (sources, target records, recipe application). Overrides steps with
STARReactiveDCStep.
STARReactiveDCStep¶
Extends SputteringDCStep with one additional sub-section:
| Sub-section | Type | Description |
|---|---|---|
selenium_environment |
INLSeleniumPulseParameters |
Se pulse parameters for this step |
STARSelenizationAnnealing¶
Category: STAR
Base class: StarSputtering, EntryData
Label: STAR Selenization Annealing
Selenium atmosphere annealing in the STAR chamber without active sputtering
targets. The sources field is hidden from the ELN. Steps use
STARSeAnnealingStep.
STARSeAnnealingStep¶
Extends StarStep with one additional sub-section. The voltage and power
fields are hidden from the ELN (not relevant without a plasma).
| Sub-section | Type | Description |
|---|---|---|
selenium_environment |
INLSeleniumPulseParameters |
Se pulse parameters for this step |